US Patent No. 7,081,711 Plasma Ion Source

Inductively generated streaming plasma ion source

Patent No. 7,081,711

Issued: July 25, 2006
Filed: October 27, 2004

Inventors: Glidden; Steven C. (Freeville, NY); Sanders; Howard D. (Ithaca, NY); Greenly; John B. (Lansing, NY)
Assignee: Applied Pulsed Power, Inc. (Ithaca, NY)

A novel pulsed, neutralized ion beam source is provided. The source uses pulsed inductive breakdown of neutral gas, and magnetic acceleration and control of the resulting plasma, to form a beam. The beam supplies ions for applications requiring excellent control of ion species, low remittance, high current density, and spatial uniformity.

REFERENCE TO RELATED APPLICATIONS

This application claims an invention which was disclosed in Provisional Application No. 60/515,050, filed Oct. 28, 2003, entitled "INDUCTIVELY GENERATED STREAMING PLASMA ION SOURCE". The benefit under 35 USC .sctn.119(e) of the U.S. provisional application is hereby claimed, and the aforementioned application is hereby incorporated herein by reference.

ACKNOWLEDGMENT OF GOVERNMENT SUPPORT

This invention was made with Government support under Grant No. DE-FG02-01ER83147, awarded by the Department of Energy. The government has certain rights in the invention.

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