Atomizing apparatus and process 

Patent No. 6,773,246

Issued: August 10, 2004
Filed: September 19, 2001
Earliest filing date in parentage: September 2, 1999

Inventors: Tsao; Chi-yuan A. (No.203-2, Wu-Fei St., Tainan, TW); Su; Yain-Hauw (No. 3, Lane 84, An-Chung Road, Shin-Tien, Taipei Hsien, TW); Chen; Yain-Ming (No. 16 Lane 226, West Sec. Tsu-Yu Road, Pintung, TW); Lin; Ray-Wen (No. 319, Der-Hauh St., Taichung, TW)

An atomizing apparatus for the production of powders or spray deposits, having an atomization device for receiving a liquid stream of molten metal or metal alloy to be atomized; at least two primary atomization gas jets for directing an atomization gas at an angle into the liquid stream in an atomization zone at an impinging point of the atomization jets to break the stream into atomized droplets; and at least two secondary jets for direction a controlling fluid at a pressure, flow rate and direction, the jets being aimed at the atomization gas jet or into the atomization zone, wherein said secondary jets control a backpressure generated by the primary atomization gas jets. The apparatus also includes means for in-situ controlling at least one of the relative positions among the primary atomization jets, the secondary jets, and the liquid delivery nozzle.

This is a continuation-in-part of application Ser. No. 09/388,494, filed Sep. 2, 1999, now abandoned entitled "Atomizing Apparatus & Process", which was a divisional application of parent patent application Ser. No. 08/751,970, filed Nov. 19, 1996, now U.S. Pat No. 5,993,509, issued Nov 30, 1999. The aforementioned application(s) are hereby incorporated herein by reference.

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